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Optical-grade polycrystalline CVD wafers

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January 08, 2026
Category Connection: Lab Grown Diamond Seeds
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Tags:
#Unpolished Rough Diamond #Flawless Lab Created Diamonds #CVD Diamond Seeds
Brief: Looking for a straightforward way to understand the role of high-purity diamond seeds in CVD growth? This video provides a clear walkthrough of our 10x10x0.3mm lab-grown diamond seeds, showcasing their uniform structure, precise dimensions, and how they enable high-quality single crystal diamond production for advanced electronic applications.
Related Product Features:
  • Available in multiple sizes including 10x10x0.3mm with precise lateral and thickness tolerances.
  • Features uniform stress distribution and no polycrystalline black spots or cracks under 20x magnification.
  • Produced using microwave plasma-assisted chemical vapor deposition (MPACVD) for high-quality single crystal growth.
  • Offers exceptional thermal conductivity up to 2200W/(m·K), ideal for high-power electronic devices.
  • Maintains low boron and nitrogen concentrations (<0.05 ppm and <20 ppm respectively) for high purity.
  • Laser-cut edges with <100> orientation and {100} face orientation for precise epitaxial growth.
  • Available with polished surfaces achieving Ra < 20 nm roughness for superior surface quality.
  • Suitable for homoepitaxial growth in 100, 110, and 111 directions on type IIb diamond seed crystals.
FAQs:
  • What are the key applications for these CVD diamond seeds?
    These diamond seeds are primarily used as substrates for single crystal CVD growth in high-performance applications, particularly for next-generation high-power, high-frequency, and low-power electronic devices where exceptional thermal conductivity and electrical insulation are critical.
  • What quality control measures ensure the reliability of these diamond seeds?
    Each seed undergoes rigorous quality checks including verification of no polycrystalline black spots or cracks under 20x magnification, uniform stress distribution under polarizer examination, precise dimensional tolerances, and confirmed low impurity concentrations of boron (<0.05 ppm) and nitrogen (<20 ppm).
  • How does the MPACVD process contribute to the quality of these diamond seeds?
    The Microwave Plasma-Assisted Chemical Vapor Deposition (MPACVD) process uses microwave resonance to break down carbon-containing gases at controlled pressures, enabling precise homoepitaxial growth that results in highly ordered crystal structures with superior physical and mechanical properties compared to other synthetic diamond forms.
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